SIB Labs Partner Facilities

Fabrication of optical micro and nanostructures requires an environment where particles, temperature and humidity are carefully controlled with effective air conditioning.

The cleanroom is an environment for many technologies used in optical structures fabrication:

• Electron Beam Lithography
• Nanoimprint Lithography
• Reactive Ion Etching
• Thin Film fabrication
• Nickel Electroplating
• Scanning Electron Microscopy

Cleanrooms at Joensuu campus are built in three phases. First 25 m2 were built in year 1995 and next 35 m2 in year 1997. Third 120 m2 cleanrooms joining the first two ones into single cleanroom unit were built in year 2006. Together with cleanroom service areas the total area of cleanroom laboratories is about 200 m2.

Newest cleanrooms makes use of modern cleanroom technology.

Further information

Senior Engineer Pertti Pääkkönen

Spectroscopy

• FTIR spectrometer - characterization of chemical structure of materials
• 400 MHz NMR spectrometry - characterization of chemical structure of materials
• Uv-vis-NIR spectrometer - characterization of chemical structure of materials, measurement of colour, transmission and reflection properties
• FTICR mass spectrometer - analyzation of chemical structure and composition of materials
• Ion trap-mass spectrometer - analyzation of chemical structure and composition of materials

Microscopy methods

• Atomic force microscopy (AFM + m-TA) - Imaging of surface structures in micometer scale, thermal conductivity and melting
• Scanning electron micrscope (FE-SEM) and Energy dispersive x-ray spectroscopy (EDS) - examination of structure of materials in nano meter scale and measurement of elemental composition
• Optical microscope (imaging) - structure of materials
• FTIR imaging - evaluation of structure and chemical composition of materials, chemical mapping
• Integrated Raman-AFM microscopies - combination of surface profile and chemical structure of materials, chemical structure as a function of sample depth (confocal)

Thermal analysis equipments

• Differential scanning calorimetry (DSC) - measurement of enthalpy change involved in chemical and physical transitions of materials, study of glass transition and melting temperatures of polymers  
• Thermo gravimetric analysis (TGA) - measurement of weight loss of materials as a function of elevated temperature
• Temperature programmed desorption (TPD) - temperature controlled reactivity of materials under oxidative or reductive conditions
• Thermal mechanical analysis (TMA) - measurement of thermal expansion of materials, Gas adsorption - physisorption and chemisorption based examination of surface areas and reactive surface sites of materials

Computation clusters

• Computation clusters (1800 prosessors) - molecular modeling, prediction of strucuture and properties of materials
• 3D printer - preparation of 3D structure models

X-ray diffraction

• Diffractometers  (single crystal) - characterization of molecular structure
• Diffractometer  (powder) - structure of powder form samples, identification of materials  and measurement of crystallinity
• Diffractometer (protein) - molecular structure of proteins

Mechanical materials testing

• Tribometer -  friction and wear properties of materials
• Material testing device - tensile and flexural testing of materials

Other instrument for materials research

• Gel cromatography (GPC) - measurement of molar mass and dispersity of polymers
• Contact angle (CA) - wettability of materials, contact angle and surface tension
• Elemental analyzer - quantitative analysis of nitrogen, sulphur, hydrogen and carbon
• Dynamic light scattering (DLS) - examination of molocule and particle size.

Preparation, tooling and coating of materials

• Midi extruder - melting and homogenization of polymers and polymer based blends or composites
• Mini injection molding device - injection molding in laboratory scale, preparation of test specimen
• Sputter coater - coating of materials with metals
• Ultra microtome - preparation of material samples
• Atomic layer epitaxy (ALD) - chemical coating of materials
• RIE-ICP plasma system (O2, Ar, CF4, He ja N2) - tailoring of surafce structure and chemistry of materials

Contact person: Janne Jänis

The Department of Technical Physics of the University of Eastern Finland is equipped with Bruker D8 DISCOVER X-ray powder diffraction equipment.

The main components of the versatile XRPD equipment are:

An automatic sample changer

• 90 sample slots (six sample towers with 15 sample slots each)
• The robot inserts and removes the samples
• Automatic measurement and saving of measurement data
• If necessary, the Rietveld refinement of measured diffractograms can be automated, for the calculation of phase percentages, for example.

Euler cradle

The device is capable of rotating samples on two axes and moving them on the X-Y-Z grid. All axels are motorised and can be used in the placement and measurement of the sample.

• For bulk and powder samples, thin films and foils
• Sample maximum height 40 mm, and maximum weight 1 kg

The cradle enables the determination of texture (crystal orientation), residual stress, reflectometer (XRP) determination for the measurement of thin films, phase depth profiling (GID) with layered samples, and measurements from microtiter plates using precisely focused X-rays (microdiffraction and high throughput screening).

Capillary spinner (installation into the Euler cradle)

• Measurements taken in the capillaries
• The capillary can be rotated during measurement
• For powder samples, liquid samples, and suspensions
• Can be used with small samples
• Used for pair distribution function analysis (PDF) in the study of the short-range order of nanocrystalline or amorphic materials
• Can be used for small-angle X-ray scattering measurements of colloid samples

Anton Paar DCS 350 –domed cooling stage (installation into the Euler cradle)

• In situ diffraction measurements at low and elevated temperatures
• From room temperature to +350 °C in air or inert gas
• From -100 °C to +350 °C in a vacuum
• Maximum sample diameter 25 mm

Installed in the Euler cradle, which allows the determination of the sample's texture at the desired temperature or monitoring of the phase transition as a function of temperature, among other functions.

LynxEye detector

• 1 D detector, 192 channels
• Possible to use with Cr, Co, Cu and Mo radiation
• Electronic limitation of fluorescence radiation to improve the signal-noise ratio of ferrous samples when using Cu radiation.
• Alternatively, Mo radiation can be used with ferrous samples.

Other notable facts

• Measurement using the normal Bragg-Brentano geometry or with parallel beam geometry (Goebel mirror).
• Also enables the measurement of uneven samples
• Cu radiation (Kα1 0.1540562 nm) and Mo radiation (Kα1 0.070930 nm) capabilities
• For texture determination and microdiffraction the Cu pipe can be turned from a line focus to a point focus.
• When measuring with the Euler cradle laser pointers for focusing the sample on the goniometer's primary and secondary circles are available for the sample’s vertical adjustment.
• A video camera is attached to the goniometer for recording the sample during measurement
• Versatile measurement and analysis software, which include Rietveld calculation

Contact person: Vesa-Pekka Lehto

• LC-qTOF mass spectrometer Agilent  G6540AA UHD Accurate Mass
• TOC analyzer Multi N/C 2100 S CLDplus BU
• Ozone analyzer Environement O342-M
• Microchip scanner Perkin-Elmer ScanArray Gx PLUS
• Flow cytometer Beckman  Coulter Quanta SC
• LC-MS  mass spectrometer Thermo Finnigan LTQ
• PCR equipment MJ Research PTC-200
• Luminometer Berthold Sirius 1
• Particle analyzer Beckman Coulter Multisizer 3
• Fotosynthesis analyzer LCPro System
• Protein analyzer Leco FP-528 CE W/C/ALDR/PC
• Transmission electron microscope Zeiss EM 900
• Various spectrometers  
• Various optical microscopes