Fabrication of optical micro and nanostructures requires an environment where particles, temperature and humidity are carefully controlled with effective air conditioning.
Cleanrooms at Joensuu campus are built in three phases. First 25 m2 were built in year 1995 and next 35 m2 in year 1997. Third 120 m2 cleanrooms joining the first two ones into single cleanroom unit were built in year 2006. Together with cleanroom service areas the total area of cleanroom laboratories is about 200 m2.
The cleanroom is an environment for many technologies used in optical structures fabrication:
- Electron Beam Lithography
- Nanoimprint Lithography
- Reactive Ion Etching
- Thin Film fabrication
- Nickel Electroplating
- Scanning Electron Microscopy
Newest cleanrooms makes use of modern cleanroom technology.
Further information: Pertti Pääkkönen